Optical inspection of a specimen using multi-channel responses from the specimen using bright and darkfield detection

ABSTRACT

A method and inspection system to inspect a first pattern on a specimen for defects against a second pattern that is intended to be the same where the second pattern has known responses to at least one probe. The inspection is performed by applying at least one probe to a point of the first pattern on the specimen to generate at least two responses from the specimen. Then the first and second responses are detected from the first pattern, and each of those responses is then compared with the corresponding response from the same point of the second pattern to develop first and second response difference signals. Those first and second response difference signals are then processed together to unilaterally determine a first pattern defect list.

This is a continuation of application of Ser. No. 08/489,019 filed onJun. 6, 1995 now abandoned.

FIELD OF THE INVENTION

The field of the present invention is optical inspection of specimens(e.g., semiconductor wafers), more specifically, probing a specimen tocreate at least two independent optical responses from the specimen(e.g., brightfield and darkfield reflections) with those responses beingconsidered in conjunction with each other to determine the occurrence ofdefects on or in the specimen.

BACKGROUND OF THE INVENTION

In the past there have been three techniques for optically inspectingwafers. Generally they are brightfield illumination, darkfieldillumination and spatial filtering.

Broadband brightfield is a proven technology for inspecting patterndefects on a wafer with the broadband light source minimizing contrastvariations and coherent noise that is present in narrow band brightfieldsystems. The most successful example of such a brightfield waferinspection system is the KLA Model 2130 (KLA Instruments Corporation)that can perform in either a die-to-die comparison mode or a repeatingcell-to-cell comparison mode. Brightfield wafer inspection systems,however, are not very sensitive to small particles.

Under brightfield imaging, small particles scatter light away from thecollecting aperture, resulting in a reduction of the returned energy.When the particle is small compared to the optical point spread functionof the lens and small compared to the digitizing pixel, the brightfieldenergy from the immediate areas surrounding the particle usuallycontribute a lot of energy, thus the very small reduction in returnedenergy due to the particle size makes the particle difficult to detect.Further, the small reduction in energy from the small particle is oftenmasked out by reflectivity variations of the bright surroundingbackground such that small particles cannot be detected without a lot offalse detections. Also, if the small particle is on an area of very lowreflectivity, which occurs for some process layers on wafers and alwaysfor reticles, photomasks and flat panel displays, the background returnis already low thus a further reduction due to the presence of aparticle is very difficult to detect.

Many instruments currently available for detecting small particles onwafers, reticles, photo masks, flat panels and other specimens usedarkfield imaging. Under darkfield imaging, flat, specular areas scattervery little signal back at the detector, resulting in a dark image,hence the term darkfield. Meanwhile, any presence of surface featuresand objects that protrude above the surface scatter more light back tothe detector. In darkfield imaging, the image is normally dark exceptareas where particles, or circuit features exist.

A darkfield particle detection system can be built based on the simpleassumption that particles scatter more light than circuit features.While this works well for blank and unpatterned specimens, in thepresence of circuit features it can only detect large particles whichprotrude above the circuit features. The resulting detection sensitivityis not satisfactory for advanced VLSI circuit production.

There are instruments that address some aspects of the problemsassociated with darkfield. One instrument, by Hitachi, uses thepolarization characteristics of the scattered light to distinguishbetween particles and normal circuit features. This is based on theassumption that particles depolarize the light more than circuitfeatures during the scattering process. However, when the circuitfeatures become small, on the order of, or smaller than, the wavelengthof light, the circuit can depolarize the scattered light as much asparticles. As a result, only larger particles can be detected withoutfalse detection of small circuit features.

Another enhancement to darkfield, which is used by Hitachi, Orbot andothers, positions the incoming darkfield illuminators such that thescattered light from circuit lines oriented at 0°, 45° and 90° areminimized. While this works on circuit lines, the scattering light fromcorners are still quite strong. Additionally, the detection sensitivityfor areas with dense circuit patterns has to be reduced to avoid thefalse detection of corners.

Another method in use today to enhance the detection of particles isspatial filtering. Under plane wave illumination, the intensitydistribution at the back focal plane of a lens is proportional to theFourier transform of the object. Further, for a repeating pattern, theFourier transform consists of an array of light dots. By placing afilter in the back focal plane of the lens which blocks out therepeating light dots, the repeating circuit pattern can be filtered outand leave only non-repeating signals from particles and other defects.Spatial filtering is the main technology employed in wafer inspectionmachines from Insystems, Mitsubishi and OSI.

The major limitation of spatial filtering based instruments is that theycan only inspect areas with repeating patterns or blank areas. That is afundamental limitation of that technology.

In the Hitachi Model IS-2300 darkfield spatial filtering is combinedwith die-to-die image subtraction for wafer inspection. Using thistechnique, non-repeating pattern areas on a wafer can be inspected bythe die-to-die comparison. However, even with die-to-die comparison, itis still necessary to use spatial filtering to obtain good sensitivityin the repeating array areas. In the dense memory cell areas of anwafer, the darkfield signal from the circuit pattern is usually so muchstronger than that from the circuit lines in the peripheral areas thatthe dynamic range of the sensors are exceeded. As a result, either smallparticles in the array areas cannot be seen due to saturation, or smallparticles in the peripheral areas cannot be detected due to insufficientsignal strength. Spatial filtering equalizes the darkfield signal sothat small particles can be detected in dense or sparse areas at thesame time.

There are two major disadvantages to the Hitachi darkfield/spatialfiltering/die-to-die inspection machine. First, the machine detects onlyparticle defects, no pattern defects can be detected. Second, since thefiltered images are usually dark without circuit features, it is notpossible to do an accurate die-to-die image alignment, which isnecessary for achieving good cancellation in a subtraction algorithm.Hitachi's solution is to use an expensive mechanical stage of very highprecision, but even with such a stage, due to the pattern placementvariations on the wafer and residual errors of the stage, the achievablesensitivity is limited roughly to particles that are 0.5 μm and larger.This limit comes from the alignment errors in die-to-die imagesubtraction.

Other than the activity by Hitachi, Tencor Instruments (U.S. Pat. No.5,276,498), OSI (U.S. Pat. No. 4,806,774) and IBM (U.S. Pat. No.5,177,559), there has been no interest in a combination of brightfieldand darkfield techniques due to a lack of understanding of theadvantages presented by such a technique.

All of the machines that are available that have both brightfield anddarkfield capability, use a single light source for both brightfield anddarkfield illumination and they do not use both the brightfield and thedarkfield images together to determine the defects.

The conventional microscope that has both brightfield and darkfieldillumination, has a single light source that provides both illuminationssimultaneously, thus making it impossible to separate the brightfieldand darkfield results from each other.

In at least one commercially available microscope from Zeiss it ispossible to have separate brightfield and darkfield illumination sourcessimultaneously, however, there is a single detector and thus there is noway to separate the results of the brightfield and darkfieldillumination from each other. They simply add together into one combinedfull-sky illumination.

It would be advantageous to have a brightfield/darkfield dualillumination system where the advantages of both could be maintainedresulting in a enhanced inspection process. The present inventionprovides such a system as will be seen from the discussion below. In thepresent invention there is an unexpected result when brightfield anddarkfield information is separately detected and used in conjunctionwith each other.

SUMMARY OF THE INVENTION

The present invention provides a method and inspection system to inspecta first pattern on a specimen for defects using at least two opticalresponses therefrom. To perform that inspection the first pattern iscompared to a second pattern that has been caused to produce the same atleast two optical responses. To perform the inspection, the same pointon the specimen is caused to emit at least two optical responses. Eachof those optical responses (e.g., darkfield and brightfield images) arethen separately detected, and separately compared with the sameresponses from the same point of the second pattern to separatelydevelop difference signals for each of the types of optical responses.Then those separately difference signals are processed to unilaterallydetermine a first pattern defect list.

That first pattern defect list can then be carried a step further toidentify known non-performance degrading surface features and to excludethem from the actual defect list that is presented to the system user.

Another variation is to introduce additional probes to produce more thantwo optical responses from the specimen to further refine the techniqueto determine the defect list.

Additionally, if the specimen permits transmitted illumination, opticalresponse detection systems can be include below the specimen to collecteach of the transmitted responses to further refine the defect list andto include defects that might be internal to the specimen.

BRIEF DESCRIPTION OF THE FIGURES

FIG. 1 is a block diagram of a prior art inspection system that performsbrightfield or darkfield inspection of a wafer serially using a singlesignal processing channel.

FIG. 2a is a graph of the results of a prior art brightfield inspectionwherein a threshold level is determined and all signals having a signalabove that value are classified as defects.

FIG. 2b is a graph of the results of a prior art darkfield inspectionwherein a threshold level is determined and all signals having a signalabove that value are classified as defects.

FIG. 2c is a graph of the results of a prior art full-sky inspectionwherein a threshold level is determined and all signals having a signalabove that value are classified as defects.

FIG. 3 is a plot of the brightfield difference versus the darkfielddifference signals of the prior art with defects being associated withthose regions of the wafer being tested that have a brightfield anddarkfield difference signal that exceeds both thresholds.

FIG. 4 is a block diagram of a prior art inspection system that has beenmodified to perform brightfield and darkfield inspection of a wafer intwo separate signal processing channels.

FIG. 5a is a block diagram of the inspection system of the presentinvention that performs brightfield and darkfield inspection of a waferin the same processing channel.

FIG. 5b is a block diagram of the defect detector shown in FIG. 5a.

FIG. 6 is a plot of the brightfield difference versus the darkfielddifference of the present invention with defects being associated withthose regions that have not been programmed into the post processor asbeing those regions that are not of interest.

FIG. 7 is a plot of the combination of the plots of FIGS. 3 and 6 toillustrate where the brightfield and darkfield thresholds in the priorart would have to be placed to avoid all of the regions of this plotthat are not of interest.

FIG. 8 is a simplified schematic diagram of a first embodiment of thepresent invention that uses separate brightfield and darkfieldillumination sources.

FIG. 9 is a simplified schematic diagram of a second embodiment of thepresent invention that uses a single illumination source for bothbrightfield and darkfield illumination.

FIG. 10 is a simplified schematic diagram of a third embodiment of thepresent invention that is similar to that of FIG. 8 with two darkfieldillumination sources, two brightfield illumination sources, and twodarkfield detectors and two brightfield detectors.

FIG. 11 is a simplified schematic diagram of a fourth embodiment of thepresent invention that uses separate brightfield and darkfieldillumination sources for inspecting a specimen that is transmissive.

DESCRIPTION OF THE PREFERRED EMBODIMENT

Historically, the majority of defect inspection machines perform usingeither brightfield or darkfield illumination, not both. Thus the typicalprior art machines are as shown in FIG. 1 with either brightfield ordarkfield illumination.

In the system of FIG. 1, wafer 14 is illuminated by the appropriatebrightfield or darkfield light source 10 or 12, respectively. Duringoperation, sensor 16, shown here as a TDI (time delay integration) withPLLAD (Phase Locked Loop Analog to Digital conversion), captures theimage from wafer 14 and loads a signal representative of that image intoinput buffer 18, (e.g., RAM). From buffer 18 the data is fed to defectdetector 22 where the data from the sample being inspected is comparedto a similar sample or reference wafer under control of delay 20 whichprovides the timing to allow for the die-to-die or cell-to-cellcomparison by defect detector 22. The data from defect detector 22 isthen applied to post processor 24 where the sizing and locating of thedefects is performed to generate a defect list with a defect thresholdvalue (e.g., KLA Instruments Models 2111, 2131 are such brightfieldinspection machines).

If the machine of FIG. 1 were to be modified to perform both brightfieldand darkfield inspection with separate brightfield and darkfieldresults, which is not currently done by any available inspectionmachine, one obvious way to perform the brightfield and darkfieldfunctions would be to perform those functions serially with nointeraction between the data of each run. In one run a light sourcewould be employed to provide brightfield illumination 10, and in anotherrun a light source would provide darkfield illumination 12. Assumingthat brightfield illumination was used in the first run as describedabove for a currently available brightfield inspection system, in asubsequent run, wafer 14 could be illuminated with darkfieldillumination 12 and sensor 16 would then image the darkfield image ofwafer 14 which is then operated on by buffer 18, delay 20, defectdetector 22 and post processor 24 as was the brightfield image to createa darkfield defect list 28 with post processor 24 separately generatinga darkfield defect threshold value.

Thus, image points on wafer 14 that correspond to a data point in thebrightfield defect list 26 has a value that exceeds the brightfielddefect threshold value resulting in that point on wafer 14 beingidentified as including a defect. Separately, and using the sameoperational technique, the darkfield defect list values that exceed thedarkfield defect threshold correspond to points on wafer 14 beingidentified as being occupied by a defect. Therefore, it is entirelypossible that points on wafer 14 may be identified as being occupied bya defect by one of the brightfield and darkfield imaging and not both,and possibly by both. Thus, post processor 24 would provide twoindividual, uncorrelated, defect lists, one of defects detected usingbrightfield illumination 10 and the second using darkfield illumination12.

FIGS. 2a and 2b illustrate the defect decision technique of the priorart. Namely, the establishment of a linear decision boundary (34 or 40)separately in each of the brightfield data and the dark field data witheverything represented by signals having values (32 or 38) below thatboundary being accepted as a non-defect areas on wafer 14, while theareas on wafer 14 that correspond with the signals having values (30 or36) above that boundary being identified as defect regions. As will beseen from the discussion with respect to the present invention, thedefect/non-defect boundary in reality is not linear which the prior artdefect detection machines assume it to be.

Referring next to FIG. 3, there is shown a plot of the brightfielddifference versus the darkfield difference with the individuallydetermined brightfield and darkfield thresholds 34 and 40, respectively,indicated. Thus, given the prior art if it were decided to use bothbrightfield and darkfield data to determine more accurately which arethe actual defects, which is not done, then only those regionsassociated with both brightfield and darkfield difference signals thatexceed the respective brightfield or darkfield threshold levels would beidentified as defects (i.e., region 38 in FIG. 3).

In the few machines that are available that simultaneously use bothbrightfield and darkfield illumination, they do so to provide what hascome to be known as full-sky illumination (e.g., Yasuhiko Hara, SatoruFushimi, Yoshimasa Ooshima and Hitooshi Kubota, "Automating Inspectionof Aluminum Circuit Pattern of LSI Wafers", Electronics andCommunications in Japan, Part 2, Vol. 70, No.3, 1987). In such a system,wafer 14 is simultaneously illuminated by both brightfield and darkfieldillumination 10 and 12, probably from a single illumination source, andemploys a single sensor 16 and single processing path 18-24 that resultsin a single output as shown in FIG. 2c from the full-sky illumination,not the two responses from the two separate runs as just discussedabove. Here the threshold is also an unrealistic linear threshold.

FIG. 4 illustrates a second modification of the defect detectioninstruments of the prior art to perform both brightfield and darkfielddefect detection concurrently. This can be accomplished by including twodata processing channels, one for brightfield detection and a second onefor darkfield detection. In such an instrument there would be either asingle light source or dual brightfield and darkfield light sources thatare used either sequentially, or together in a full-sky mode, thatprovides both brightfield and darkfield illumination to wafer 14. Thedifference between the configuration shown here and that in FIG. 1, isthat the single processing channel of FIG. 1 has been duplicated so thatboth the brightfield and the darkfield operations can be performedsimultaneously or separately in the same way that each run was performedin the configuration of FIG. 1 with each channel being substantially thesame as the other. This then results in the simultaneous and separategeneration of brightfield defect list 26 and darkfield defect list 28,independent of each other.

A system as shown in FIG. 4 has an advantage over that of FIG. 1, if theprocesses of each path is synchronized with the other so that they eachproceed at the speed of the slowest, in that the brightfield anddarkfield inspections are done in a single scan resulting in the twodefect lists, or maps, being in alignment, one with the other since thedata is developed in parallel and concurrently. However, as with theprior art system of FIG. 1, the system of FIG. 4 results in independentbrightfield and darkfield lists (26 and 28) each with an independentlydetermined defect threshold that linearly determines what is a defectand what is not a defect. Thus, what is shown in, and the discussionwhich accompanies each of FIGS. 2a, 2b and 3, apply equally to thesystem of FIG. 4.

Turning now to the present invention. FIG. 5a is a block diagramrepresentation of the present invention. The left side is similar to theleft side of the prior art diagram of FIG. 4 with the exception that thebrightfield and darkfield images of wafer 14 are individually capturedby brightfield and darkfield sensors 16 and 16', respectively, with thesignals representing those images from sensors 16 and 16' being appliedindividually to brightfield and darkfield buffers 18 and 18',respectively, with individual delay lines 20 and 20' therefrom. That iswhere the similarity to the extension of the prior art of FIG. 4 ends.

From buffers 18 and 18', and delays 20 and 20', the signals therefrom,those signals being representative of both the brightfield and thedarkfield images, are applied to a single defect detector 41 (shown inand discussed in more detail relative to FIG. 5b) where the informationfrom both images is utilized to determine the locations of the defectson wafer 14. The overall, combined, unilaterally determined defect listfrom defect detector 41 is then operated on by post processor 42 toidentify the pattern defects 44 and particles 46. Post processor 41 canbe based on a high performance general purpose Motorola 68040 CPU basedVME (Virtual Machine Environment) bus processing boards or a highperformance post processor board that is similar to the post processorused in KLA Instruments Model 2131.

It is known that semiconductor wafers often include surface featuressuch as contrast variations, grain and grain clusters, as well asprocess variations that may be a chemical smear, each of which do notimpact the performance of a die produced on such a wafer. Each of thesesurface features also have a typical range of brightfield and darkfieldimage values associated with them. Additionally, as with any imagingsystem, there is some noise associated with the operation of thedetection system and that noise causes variations in the brightfield anddarkfield difference signals at the low end of each.

Thus, if the typical range of brightfield and darkfield differencevalues of those surface features and system noise are plotted againsteach other, then they generally appear as in FIG. 6. Here it can be seenthat system noise 54, surface contrast variations 56 and grain 58 appearfor low values of both brightfield and darkfield difference values,process variations are over about 75% of the range for brightfield andmid-range for darkfield difference values, and grain clusters appear inthe higher values of both brightfield and darkfield difference values.Ideally the best system would be one that can exclude these predictablevariations without identifying them as defects, and to be able to thusidentify all other responses 48 as defects.

FIG. 5b is a partial block diagram of the circuit shown in FIG. 5a withadded detail of defect detector 41. In this simplified block diagram ofdefect detector 41, the input signals are received from input buffers 18and 18', and delays 20 and 20', by filters 90, 90', 92 and 92',respectively. Each of filters 90, 90', 92 and 92' are used topre-process the image data and can be implemented as 3×3 or 5×5 pixeldigital filters that are similar to those used for the same purpose inKLA Instruments Model 2131. The pre-processed images from filters 90 and92, and 90' and 92', are applied to subtractor 94 and 94', respectively,where the brightfield and darkfield images are compared with the delayedversion with which a comparison is performed. Where, for die-to-diecomparison, the delay is typically one die wide, and for cell-to-cellcomparison, the delay is typically one cell wide, with the same delaybeing used in both the brightfield and darkfield paths. Thus, the outputinformation from subtractors 94 and 94' is, respectively, thebrightfield and darkfield defect information from wafer 14. Thatinformation, in turn, is applied to both a two dimensional histogramcircuit 96 and post processor 42. Thus, that information applieddirectly to post processor 42 provides the axis values for FIG. 6, whiletwo dimensional histogram circuit 96 forms the two dimension histogramof the defect data with brightfield difference on one axis and darkfielddifference on the other axis in FIG. 6. That histogram information isthen applied to a defect decision algorithm 98 to determine theboundaries of the known types of surface and other variations (e.g.,system noise, grain, contrast variation, process variations, and grainclusters, and any others that are known to result routinely from aparticular process that do not present an operational problem on thefinished item).

FIG. 7 illustrates what would have to be done with the prior artapproach to avoid the identification of any of those predictable andnon-injurious responses as defects. Namely, the linearly determinedbrightfield and darkfield thresholds 34 and 40 would have to be selectedso that each is above the values of these expected responses. Thus,region 38, the combined defect region, would be very small resulting ina substantially useless approach to the problem.

Referring again to FIG. 6, on the other hand, since the presentinvention processes the individually developed brightfield and darkfieldimaging data simultaneously, defect detector 41 is programmed to definecomplex threshold functions for both the brightfield and darkfielddifference values to exclude only those regions of expected variationand thus be able to look at the remainder of all of the differencevalues 48 for both brightfield and darkfield as illustrated in FIG. 6 asall of the regions not identified by the expected causality. Stated inother words, the present invention can consider all values, 0-255 foreach of the two difference signals that are not contained in regions 50,52, 54, 56 and 58 of FIG. 6 as representing defects including low valuesfrom both the brightfield and the darkfield differences.

One physical optical embodiment of the present invention is shown in thesimplified schematic diagram of FIG. 8. Here, wafer 14 is illuminateddirectly by a darkfield illumination source 12 (e.g., a laser), and abrightfield illumination source 10 (e.g., a mercury arc lamp) via lenses60 and 62 and beamsplitter 64.

The combined brightfield and darkfield image reflected by wafer 14travels upward through condensing lens 60, through beamsplitter 64 tobeamsplitter 66. At beamsplitter 66 the brightfield image continuesupward to condensing lens 72 from which it is projected onto brightfieldsensor 16. The darkfield image, on the other hand, is reflected by adichroic coating on beamsplitter 66 given the frequency difference inthe brightfield and darkfield light sources to spatial filter 68, torelay lens 70 and onto darkfield image sensor 16'.

In the embodiment described here, the darkfield illumination is providedby a laser with spatial filter 68 corresponding to the Fourier transformplane of the image of wafer 14. In such an embodiment, spatial filter 68is constructed to selectively black out non-defective, regular patterns,to further improve defect detection.

By using two separate light sources, brightfield illumination from amercury arc lamp via beamsplitter 64 and darkfield illumination from alaser, with the ability to perform spatial filtering, as well as thelaser brightness/power properties, the light loss is limited to a fewpercent when the brightfield and darkfield information is separated.

The use of a narrow band laser source for darkfield illumination makesit possible to select either a longer wavelength laser, such as HeNe at633 nm, or laser diodes in the range of about 630 nm to 830 nm, andseparate the darkfield response from the overall response with thedichroic coating on beamsplitter 66, or any laser could be used with thedarkfield response separated out with a laser line interference filter,such as a Model 52720 from ORIEL. In the latter case with the narrowband spectral filter, the brightfield system can use a mercury linefilter, such as a Model 56460 from ORIEL. Additionally, a special,custom design laser narrow band notch filter can also be obtained fromORIEL. Thus the spatial filtering is applied only to the darkfield path,so the brightfield path will not be affected in image quality.

The use of narrow band light sources (e.g., lasers for darkfield) isnecessary for spatial filtering. The narrow band nature of a laser alsoallows easier separation of brightfield and darkfield signals by afilter or beamsplitter.

Spatial filter 68 can by made by exposing a piece of a photographicnegative in place as in FIG. 8, then remove and develop that negative,and then reinsert the developed film sheet back at location 68.Alternatively, spatial filter 86 can be implemented with an electricallyaddressed SLM (Spatial Light Modulator), such as an LCD (Liquid CrystalDisplay), from Hughes Research Lab.

The preferred approach for the separation of the darkfield imageinformation from the overall image response, given the choice of opticalcomponents presently available, is the use of a beamsplitter 66 with adichroic coating and a spatial filter 68 since it produces bettercontrol of the dynamic range/sensitivity of the system and the abilityof the system to perform the simultaneous inspection with thebrightfield image information. However, given advances in opticaltechnology, the dichroic beamsplitter approach, or another approach notcurrently known, might prove more effective in the future whileobtaining the same result.

FIG. 9 is a schematic representation of a second embodiment of thepresent invention. In this embodiment a single laser 76 provides bothbrightfield and darkfield illumination of wafer 14 via beamsplitter 80that reflects the light downward to condenser lens 78 and onto wafer 14.Simultaneous brightfield and darkfield imaging is performed in thisembodiment with darkfield detectors 74 at a low angle to wafer 14 andbrightfield sensor 82 directly above wafer 14 receiving that informationfrom wafer 14 via condenser lens 78 and through beamsplitter 80. Tooptimize defect detection using this embodiment, the output signals frombrightfield detector 82 and darkfield detectors 74 are processedsimultaneously to detect the defects of interest.

The approaches described here, using broadband brightfield and spatialfiltered darkfield images in die-to-die comparison, overcomes all thelimitations of existing machines. The existence of the brightfield imageallows for a very accurate alignment of images from two comparison dies.By pre-aligning the darkfield and brightfield sensors so they both imagethe exact same area, the alignment offsets only need to be measured inthe brightfield channel and then applied to both channels. This ispossible since the offset between the brightfield and darkfield sensorsis fixed, having been adjusted and calibrated at the time of machinemanufacture, thus such offset remains fixed in machine operation withthat offset remaining known. Thus the high speed alignment offsetmeasurement electronics need not be duplicated for the darkfieldchannel. Using the alignment information from the brightfield images,the darkfield channel can also achieve a very accurate die-to-diealignment so detection of small particles is no longer limited by theresidual alignment error. As stated above, the use of spatial filteringin the darkfield processing is currently preferred to filter out most ofthe repeating patterns and straight line segments, equalizing thedynamic range so small particles can be detected in both dense andsparse areas in one inspection.

In addition, the simultaneous consideration of darkfield and brightfieldimages offers significantly more information. For example, becausebrightfield imaging permits the detection of both pattern and particledefects and darkfield imaging permits the detection only of particles,the difference of the two results is pattern defects only. This abilityto separate out particles from pattern defects automatically in realtime is an unique capability of the technique of the present invention,which is of great value in wafer inspection systems. For this particularapplication, since darkfield imaging is more sensitive to particles thanbrightfield imaging, the darkfield imaging sensitivity can be slightlyreduced to match that of brightfield imaging so that the defectsdetected by both channels are particles and defects detected only bybrightfield imaging are pattern defects. Another example is inspectionof metal interconnect layers of semiconductor wafers. One would alsoexpect that by combining the results from darkfield and brightfieldimaging, nuisance defects from metal grain can be better separated fromreal defects.

The brightfield and darkfield images, and corresponding delayed images,could be collected and stored individually, and then fed, in alignment,into defect detector 41 as in FIG. 5a. In order to perform the detectionin this way a dynamic RAM that is Gigabytes in size would be necessaryto store the data and the data would have to be read out of that RAM inregistration with each other as is done in the real time process of FIG.5a as discussed above. While this is feasible and may become attractivein the future, given today's technology the preferred approach is toinspect the wafer in both brightfield and darkfield in real time forfaster time to results with this approach being more cost effective intoday's market.

In whatever implementation that is used, the brightfield and darkfieldimages from the same point on wafer 14 are observed by two differentdetectors. It is very important to know from the same location on wafer14, what the relationship of the brightfield and darkfield images are(e.g., where the darkfield signal is strong and the brightfield signalis weak). Simply adding the two signals together does not yield the sameresult--that differentiation is cancelled out which reduces the abilityto detect defects.

What the present invention provides is different illumination atdifferent angles, which is separated out to yield a full characteristicof what is actually occurring on wafer 14. To perform this operation, itis necessary that the two sensors be aligned and registered with eachother. Thus, since that alignment and registration are expensive andincrease the complexity of the defect detection system, the advantagesthat have been recognized by the present invention were not known sincethat has not been done in the prior art.

Further, while the discussion up to this point has been limited to usingsingle frequency brightfield and darkfield illumination for defectdetection, the technique of the present invention can naturally beextended to include more channels of information (e.g., multiplefrequencies of both brightfield and darkfield illumination). The key tothis extension is the same as has been discussed for the two channels ofinformation discussed above, namely, each would have to be applied tothe same region of wafer 14 and individually detected with a separatedetector, followed by a combination of the detected results as has beendiscussed with relation to FIG. 6 for just the two.

If there are more than two channels of information, FIG. 6 becomesmulti-dimensional. While it is not possible to illustrate more thanthree dimensions on paper, computers and numerical methods are readilyavailable to deal with multi-dimensional information.

FIG. 10 is FIG. 8 modified to handle multiple brightfield and darkfieldimages, namely two of each. Rather than repeat the entire description ofFIG. 8, let it be understood that all of the elements of FIG. 8 remainhere and function in the same way as in FIG. 8. For the second darkfieldchannel, lasers 12' that operate at a different frequency than laser 12have been added to illuminate the same location on the surface ofspecimen 14. To provide the second brightfield illumination to specimen14, light source 10' of a different frequency than light source 10, lens62' and beamsplitter 64' have been provided to also direct brightfieldillumination to again the same location on specimen 14. In thereflective mode also the operation is similar to that of FIG. 8 with theaddition of beamsplitter 66' with a dichroic film thereon to reflectlight of the frequency from the second lasers 12' to spatial filter 68',lens 70' and detector 16". Further, beamsplitter 73 with a dichroic filmthereon to reflect light of the frequency from one of the brightfieldillumination sources 10 and 10' to detector 16'", with the light passingthrough beamsplitter 73 being light of the frequency of the otherbrightfield illumination since the other light has been subtracted fromthe direct reflected beam by beamsplitters 66, 66' and 73.

It should be understood that the embodiment of FIG. 10 is just onemodification of the embodiment that is shown in FIG. 8. To particularlyidentify specific defects from other defects, there is any number ofcombinations of the various types of components that may need to beemployed. While those specific embodiments may be different from thatdiscussed here, the concept remains the same, the use of multiplechannels of information for making defect decisions, unlike the priorart which relies on a single channel of information, namely eitherdarkfield or brightfield, not both.

Alternately, multiple passes with different wavelengths of brightfieldand darkfield light in each pass could be used, for example.

Additionally, the technique discussed here for wafers could also beextended to transmissive materials that one might want to detect defectson or in. In such an application, transmitted brightfield and darkfieldlight could also be detected and integrated with the reflectedbrightfield and darkfield signals to determine the locations of variousdefects. FIG. 11 illustrates a simplified embodiment to accomplish that.The difference between what is shown here and in FIG. 8, is that onlysimilar light detection components are reproduced beneath specimen 14'.

The combined transmitted brightfield and darkfield image informationtravels downward from the bottom surface of specimen 14' throughcondensing lens 60^(T) to beamsplitter 66^(T). At beamsplitter 66^(T)the brightfield image continues downward to condensing lens 72^(T) fromwhich it is projected onto transmitted brightfield sensor 16^(T) Thetransmitted darkfield image, on the other hand, is reflected by adichroic coating on beamsplitter 66^(T) given the frequency differencein the brightfield and darkfield light sources to spatial filter 68^(T),to relay lens 70^(T) and onto sensor darkfield image 16^(T) '.

The concepts of the present invention have been discussed above for thespecific case of brightfield and darkfield illumination and independentdetection of the brightfield and darkfield responses from the specimen.In the general case the present invention includes several elements:

a) at least one probe to produce at least two independent opticalresponses from the same area of the same die of the specimen beinginspected and if more than one probe is used all of the probes arealigned to direct their energy to the same area of the same die of thespecimen;

b) individual detection of each of the optical responses and comparisonof each response with a similar response from the same area of anotherdie of the specimen with the responses from the two die being comparedto create a difference signal for that optical response; and

c) processing the multiple response difference signals together tounilaterally determine a first pattern defect list.

This generalized process can also be extended as has thebrightfield-darkfield example given above by post processing the firstpattern defect list to identify known non-performance degrading surfacefeatures and eliminating them from the final pattern defect list.

In the specific discussion of the figures above one or more probes wherediscussed to produce two or more optical responses. In FIG. 9 there is asingle probe, laser 76, that is providing both brightfield and darkfieldillumination of the specimen, wafer 14, and there are two independentdetectors, darkfield detectors 74 and brightfield detector 82 for twochannels of information. In FIG. 8 there are two probes, laser 12 thatis providing darkfield illumination of the specimen, wafer 14, and lamp10 that is providing brightfield illumination of the specimen; and thereare two independent detectors 16 and 16' for reflections of thebrightfield and darkfield illuminations respectively for two channels ofinformation. FIG. 10 is an extension of the system of FIG. 8 with seconddarkfield and brightfield sources being added thus making for fourprobes, as well as an additional one of each a darkfield detector and abrightfield detector making for four channels of information. Also, FIG.11 is similar to FIG. 8 with two probes, brightfield and darkfieldillumination, and the addition of the detection of transmittedbrightfield and darkfield radiation for a total of four channels ofinformation, reflected and transmitted brightfield and reflected andtransmitted darkfield.

In each of the examples given above, there has been no frequency orphase shift between the illumination emitted by the probe and thedetector, other than for sorting between the brightfield and darkfieldsignals. Fluorescence is a well known response by some materials whenexposed to radiation within a particular frequency band. When a materialfluoresces the secondary radiation from that material is at a lowerfrequency (higher wavelength) than the frequency (wavelength) of theinducing, or probe, illumination. With some material, to detectpotential defects it may be advantageous to be able to monitor thefrequency shift produced by that fluorescence. Since the frequency atwhich each material fluoresces is well known, dichroic coatings onbeamsplitters and detectors that are sensitive to those frequencies canbe included in the imaging path to detect that effect together withothers that are considered of value.

Similarly, when there is a difference in the optical path from the probeto different portions of the surface of the specimen (e.g., a heightvariation, perhaps in the form of a step on the surface of the specimen,or different regions with different indices of refraction) the reflectedillumination will be phase shifted with respect to the probe emittedillumination. For some types of defects it would prove advantageous tohave phase information as one channel of information to the defectdetector. Interferometers are readily available to detect this phaseshift, and can also detect contrast variations on the surface of thespecimen. There are a variety of interferometers available includingMach-Zehnder, Mirau, Jamin-Lebedeff, as well as beam-shearinginterferometers to serve this purpose. Additionally, the magnitude ofthe gradient of the change in phase can be monitored with adifferential, or Nomarski, interference contrast microscope.

Also related to phase information is polarization changes that may occuras a result of a feature of the specimen, that also could provide achannel of information. For instance, if the specimen is spatiallyvarying in birefringence, transmitted probe light will reveal thisinformation. Similarly, if the specimen has polarization-selectivereflection or scattering properties, reflected probe light will revealthis information. The polarization shift of the probe light can also bedetected with readily available detectors and provide an additionalchannel of information for the inspection process of a specimen fromeither above or below the specimen depending on the construction of thespecimen and the angle of illumination.

Confocal illumination is another type of probe that might be consideredto make the detection of the topography of the specimen another channelof information.

Yet another technique that can be used with most of the probe variationsthat have been mentioned, as well as others that have not, and may nothave yet been discovered, is the inclusion of temporal information(e.g., pulsing the illumination on/off with a selected pattern) in theprobe illuminations. That temporal signal then could be used in thedetection step to sort, or demultiplex, the responses to that signalfrom the others present to simplify detection. Any time shift, or timedelay, in that temporal signal could also be used in the detection stepto determine topographical features that may be present on or in thespecimen.

There are also several available cameras that have multiple sensors inthe same package. An RGB (red-green-blue) camera is such a camera thatutilizes three CCDs in the same envelope. The use of such a cameraautomatically yields alignment of all three sensors by the singlealignment step of each CCD. Here each is a separate sensor withindividual signal processing.

In each of the embodiments of the present invention it is necessary thateach of the probes be aligned to direct their energy to the samelocation on the specimen, and, also, that each of the detectors bealigned to image the same size and location on the specimen.

While this invention has been described in several modes of operationand with exemplary routines and apparatus, it is contemplated thatpersons skilled in the art, upon reading the preceding descriptions andstudying the drawings, will realize various alternative approaches tothe implementation of the present invention. It is therefore intendedthat the following appended claims be interpreted as including all suchalterations and modifications that fall within the true spirit and scopeto the present invention and the appended claims.

What is claimed is:
 1. A method of inspection of a first pattern on a specimen for defects to be compared against a second pattern that is intended to be the same, said second pattern has known reflected darkfield and brightfield images at each point of interest, said method comprising the steps of:a. illuminating said first pattern on said specimen with both darkfield and brightfield illumination; b. detecting a reflected darkfield image from said first pattern at said each point of interest independent of a brightfield image at said each point of interest; c. detecting a reflected brightfield image from said first pattern at said each point of interest independent of a darkfield image at said each point of interest; d. comparing said reflected darkfield image of step b. against said reflected darkfield image from said second pattern to develop a reflected darkfield difference signal at each corresponding point of interest in each of said first and second patterns; e. comparing said reflected brightfield image of step c. against said reflected brightfield image from said second pattern to develop a reflected brightfield difference signal at said each corresponding point of interest in each of said first and second patterns; and f. utilizing both of said reflected darkfield and brightfield difference signals from steps d. and e. together at said each point of interest as coordinates of a combined reflected pattern defect map.
 2. A method of inspection as in claim 1 further including the step of:g. post processing said combined reflected pattern defect map of step f. to identify and remove known non-performance degrading surface features from said combined reflected pattern defect map.
 3. A method of inspection as in claim 1 wherein step a. includes the steps of:g. illuminating said first pattern area with illumination from a darkfield illumination source; and h. illuminating said first pattern area with illumination from a brightfield illumination source.
 4. A method of inspection as in claim 3 wherein said darkfield and brightfield illumination sources of steps g. and h. provide illumination of different frequencies.
 5. A method of inspection as in claim 4 wherein:said darkfield illumination source provides narrow band illumination; and step b. includes the step of:i. passing said reflected darkfield image through a spatial filter to enhance defect detection.
 6. A method of inspection as in claim 1 wherein:said specimen is optically transmissive and said second pattern has known transmitted darkfield and brightfield images; said method further includes the steps of:g. detecting a transmitted darkfield image from said first pattern at said each point of interest independent of a brightfield image at said each point of interest; h. separately detecting a transmitted brightfield image from said first pattern at said each point of interest independent of a darkfield image at said each point of interest; i. comparing said transmitted darkfield image of step g. against said transmitted darkfield image from said second pattern to develop a transmitted darkfield difference signal at said each corresponding point of interest in each of said first and second patterns; and j. comparing said transmitted brightfield image of step h. against said transmitted brightfield image from said second pattern to develop a transmitted brightfield difference signal at said each corresponding point of interest in each of said first and second patterns; and step f. includes the step of:k. utilizing both of said transmitted darkfield and brightfield difference signals of steps i. and j. at said each point of interest as coordinates to determine a combined transmitted pattern defect map.
 7. A method of inspection as in claim 6 further including the step of:l. post processing said combined transmitted pattern defect map of step k. to identify and remove known non-performance degrading surface features from said combined transmitted pattern defect map.
 8. A method of inspection as in claim 6 wherein step a. includes the steps of:l. illuminating said first pattern with illumination from a darkfield illumination source; and m. illuminating said first pattern with illumination from a brightfield illumination source.
 9. A method of inspection as in claim 8 wherein said darkfield and brightfield illumination sources of steps l. and m. provide illumination of different frequencies.
 10. A method of inspection as in claim 9 wherein:said darkfield illumination source provides narrow band illumination; step b. includes the step of:n. spatial filtering said reflected darkfield image to enhance defect detection; and step g. includes the step of:o. spatial filtering said transmitted darkfield image to enhance defect detection.
 11. A method of inspection as in claim 6 further including the step of:l. overlaying said reflected and transmitted pattern defect maps of steps f. and k, respectively, to produce a combined reflected and transmitted pattern defect map.
 12. A method of inspection as in claim 11 further including the step of:m. post processing said combined reflected and transmitted pattern defect map of step l to identify and remove known non-performance degrading surface features from said combined reflected and transmitted pattern defect map.
 13. An inspection system to inspect a first pattern on a specimen for defects to be compared against a second pattern that is intended to be the same, said second pattern has known reflected darkfield and brightfield images at each point of interest, said inspection system comprising:a darkfield and brightfield illumination system to illuminate said first pattern on said specimen; a reflected darkfield image detector positioned to detect a reflected darkfield image from said each point of interest on said first pattern on said specimen independent of a brightfield image at said each point of interest; a reflected brightfield image detector positioned to detect a reflected brightfield image from said each point of interest on said first pattern on said specimen independent of a darkfield image at said each point of interest; a reflected darkfield comparator coupled to said darkfield detector to generate a darkfield difference signal at said each point of interest by comparing said reflected darkfield image from said darkfield image detector and said reflected darkfield image from said second pattern to develop a reflected darkfield difference signal at each corresponding point of interest in each of said first and second patterns; a reflected brightfield comparator coupled to said brightfield detector to generate a brightfield difference signal at said each point of interest by comparing said reflected brightfield image from said brightfield image detector and said reflected brightfield image from said second pattern to develop a reflected brightfield difference signal at said each corresponding point of interest in each of said first and second patterns; and a processor coupled to said darkfield and brightfield comparators to utilize both of said reflected darkfield and brightfield difference signals at said each point of interest as coordinates of a reflected pattern defect map.
 14. An inspection system as in claim 13 further including a post processor coupled to said processor to receive said reflected pattern defect map to identify known non-performance degrading surface features and to delete them from said reflected pattern defect map.
 15. An inspection system as in claim 13 wherein said darkfield and brightfield illumination system includes:a darkfield illumination subsystem; and a brightfield illumination subsystem.
 16. An inspection system as in claim 15 wherein said darkfield and brightfield illumination subsystems provide illumination of different frequencies from each other.
 17. An inspection system as in claim 16 wherein:said darkfield illumination subsystem provides narrow band illumination; and said darkfield image detector includes a spatial filter through which said reflected darkfield image is passed to enhance defect detection.
 18. An inspection system as in claim 13 wherein:said specimen is optically transmissive and said second pattern has known transmitted darkfield and brightfield images; said inspection system further includes:a transmitted darkfield image detector positioned to detect a transmitted darkfield image from said first pattern and said specimen at said each point of interest independent of a brightfield image at said each point of interest; a transmitted brightfield image detector positioned to detect a transmitted brightfield image from said first pattern and said specimen at said each point of interest independent of a darkfield image at said each point of interest; a transmitted darkfield comparator coupled to said transmitted darkfield detector to generate a transmitted darkfield difference signal by comparing said transmitted darkfield image from said transmitted darkfield image detector and said transmitted darkfield image from said second pattern to develop a transmitted darkfield difference signal at said each corresponding point of interest in each of said first and second patterns; and a transmitted brightfield comparator coupled to said transmitted brightfield detector to generate a transmitted brightfield difference signal by comparing said transmitted brightfield image from said transmitted brightfield image detector and said transmitted brightfield image from said second pattern to develop a transmitted brightfield difference signal at said each corresponding point of interest in each of said first and second patterns; and said processor is also coupled to said transmitted darkfield and brightfield comparators to also receive said transmitted darkfield and brightfield difference signals at said each point of interest as coordinates of a combined transmitted pattern defect map.
 19. An inspection system as in claim 18 further including a post processor coupled to said processor to receive said combined transmitted pattern defect map to identify known non-performance degrading surface features and to delete them from said transmitted pattern defect map.
 20. An inspection system as in claim 18 wherein said darkfield and brightfield illumination system includes:a darkfield illumination subsystem; and a brightfield illumination subsystem.
 21. An inspection system as in claim 20 wherein said darkfield and brightfield illumination subsystems provide illumination of different frequencies from each other.
 22. An inspection system as in claim 21 wherein:said reflected darkfield illumination subsystem provides narrow band illumination; said darkfield image detector includes a first spatial filter through which said reflected darkfield image is passed to enhance defect detection; and said transmitted darkfield image detector includes a second spatial filter through which said transmitted darkfield image is passed to enhance defect detection.
 23. An inspection system as in claim 18 wherein said processor overlays said reflected and transmitted pattern defect maps to produce a combined reflected and transmitted pattern defect map.
 24. An inspection system as in claim 23 wherein said processor further identifies and removes known non-performance degrading surface features from said combined reflected and transmitted pattern defect map.
 25. An inspection system as in claim 13 wherein:said darkfield and brightfield illumination system includes:a single laser illumination source; a beamsplitter positioned to reflect illumination from said laser toward said specimen; and a condenser lens intermediate said beamsplitter and said specimen to direct said illumination to said specimen; said reflected darkfield image detector is placed at a low angle to said specimen to receive said reflected darkfield image; and said reflected brightfield detector is placed above the point being inspected on said specimen to received said reflected brightfield image through said condenser lens and beamsplitter of said darkfield and brightfield illumination system.
 26. An inspection system as in claim 25 wherein:said specimen permits transmitted illumination to pass therethrough; and said inspection system further includes:a transmitted darkfield image detector placed at a low angle to said specimen on the side thereof away from said illumination sources to receive a transmitted darkfield image from said specimen; and a transmitted brightfield detector is placed directly opposite the point being illuminated on said specimen and on the side of said specimen away from said illumination sources to receive a transmitted brightfield image from said specimen.
 27. An inspection system as in claim 13 wherein:said darkfield and brightfield illumination system includes:a narrow band laser illumination source of a selected frequency placed at a low angle to said specimen to provide darkfield illumination; a mercury arc lamp; a first condenser lens to receive illumination from said mercury arc lamp; a first beamsplitter positioned to reflect brightfield illumination from said first condenser lens toward said specimen; and a second condenser lens intermediate said first beamsplitter and said specimen to direct said brightfield illumination from said first beamsplitter to said specimen at the same point on said specimen to which said darkfield illumination is directed; said reflected darkfield image detector includes:a second beamsplitter positioned on the side of said first beamsplitter away from said specimen to receive reflected illumination from said specimen through said second condenser lens and said first beamsplitter, said second beamsplitter having a dichroic coating selected to reflect darkfield image illumination originating from said laser source and permitting other illumination to pass therethrough, said second beamsplitter further positioned at an angle to reflect said darkfield image out of the path defined by said second condenser lens and first and second beamsplitters; a third lens to focus said reflected darkfield image from said second beamsplitter; and a reflected darkfield illumination detector placed to receive said reflected darkfield image from said third lens; and said reflected brightfield detector includes:a fourth lens positioned on the side of said second beamsplitter away from said specimen and in line with said second condenser lens and said first and second beamsplitters to focus the brightfield image received from said second beamsplitter; and a reflected brightfield illumination detector placed directly on the side of said fourth lens away from said specimen to received said reflected brightfield image from said specimen.
 28. An inspection system as in claim 26 wherein:said specimen permits transmitted illumination to pass therethrough; and said inspection system further includes:a fifth condenser lens on the side of said specimen away from said illumination sources to condense transmitted illumination from said specimen; a transmitted darkfield image detector including:a third beamsplitter positioned on the side of said fifth condenser lens away from said specimen to receive transmitted illumination from said specimen through said fifth condenser lens, said third beamsplitter having a dichroic coating selected to reflect transmitted darkfield image illumination originating from said laser source and permitting other illumination to pass therethrough, said second beamsplitter at an angle to reflect said transmitted darkfield image out of the path defined by said fifth condenser lens; a sixth lens to focus said transmitted darkfield image from said third beamsplitter; and a transmitted darkfield illumination detector placed to receive said transmitted darkfield image from said sixth lens; and a transmitted brightfield detector including:a seventh lens positioned on the side of said third beamsplitter away from said specimen and in line with said fifth condenser lens to focus the transmitted brightfield image received from said third beamsplitter; and a transmitted brightfield illumination detector placed on the side of said seventh lens away from said specimen to received said transmitted brightfield image from said specimen.
 29. A method of inspection of a first pattern on a specimen for defects against a second pattern that is intended to be the same, said second pattern has known first and second responses to at least one probe, said method comprising the steps of:a. applying said at least one probe to each point of said first pattern on said specimen to generate at least two responses from said each point of said first pattern; b. detecting a first response from said each point of said first pattern; c. detecting a second response from said each point of said first pattern; d. comparing said first response of step b. against said first response from the same point of said second pattern to develop a first response difference signal at said each point; e. comparing said second response of step c. against said second response from the same point of said second pattern to develop a second response difference signal at said each point; and f. processing said first and second response difference signals from steps d. and e. together as coordinates to unilaterally determine a first pattern defect map.
 30. An inspection system to inspect a first pattern on a specimen for defects against a second pattern that is intended to be the same, said second pattern has known first and second responses to at least one probe, said inspection system comprising:at least one probe to each point of said first pattern on said specimen to generate at least two responses from said each point of said first pattern on said specimen; a first response detector positioned to detect said first response from said each point of said first pattern on said specimen; a second response detector positioned to detect said second response from said each point of said first pattern on said specimen; a first response comparator coupled to said first response detector to generate a first response difference signal by comparing the output from said first response detector and said first response from the same point of said second pattern to develop a first response difference signal at said each point; a second response comparator coupled to said second response detector to generate a second response difference signal by comparing the output from said second response detector and said second response from the same point of said second pattern to develop a second response difference signal at said each point; and a processor coupled to said first and second response comparators to process said first and second response difference signals together as coordinates to unilaterally determine a first pattern defect map.
 31. A method of inspection of a first pattern on a specimen for defects to be compared against a second pattern that is intended to be the same, said second pattern having known reflected darkfield and brightfield images each resulting from different selected frequencies of illumination at each point of interest, said method comprising the steps of:a. illuminating said first pattern on said specimen with brightfield illumination from a single brightfield illumination source, and darkfield illumination from a plurality of darkfield illumination sources, each brightfield and darkfield illumination source having a different illumination frequency, the different illumination frequencies resulting in distinguishable darkfield and brightfield images of said first pattern; b. separately detecting a plurality of reflected darkfield images from said first pattern resulting from each of said plurality of darkfield illumination sources at said each point of interest independent of a brightfield image at said each point of interest; c. detecting a reflected brightfield image from said first pattern at said each point of interest independent of a darkfield image at said each point of interest; d. comparing said reflected darkfield images of step b. against said reflected darkfield image from corresponding illumination frequencies from said second pattern to develop a plurality of reflected darkfield difference signals at said each corresponding point of interest in each of said first and second patterns; e. comparing said reflected brightfield image of step c. against said reflected brightfield image from said second pattern to develop a reflected brightfield difference signal at said each corresponding point of interest in each of said first and second patterns; and f. utilizing said reflected darkfield and brightfield difference signals of steps d. and e. together at said each point of interest as coordinates of a combined pattern reflected defect map.
 32. A method of inspection of a first pattern on a specimen for defects to be compared against a second pattern that is intended to be the same, said second pattern having known reflected darkfield and brightfield images each resulting from different selected frequencies of illumination at each point of interest, said method comprising the steps of:a. illuminating said first pattern on said specimen with darkfield illumination from a single darkfield illumination source, and brightfield illumination from a plurality of brightfield illumination sources, each brightfield and darkfield illumination source having a different illumination frequency, the different illumination frequencies resulting in distinguishable darkfield and brightfield images of said first pattern; b. separately detecting a plurality of reflected brightfield images from said first pattern resulting from each of said plurality of brightfield illumination sources at said each point of interest independent of a darkfield image at said each point of interest; c. detecting a reflected darkfield image from said first pattern at said each point of interest independent of a brightfield image at said each point of interest; d. comparing said reflected darkfield image of step c. against said reflected darkfield image from said second pattern to develop a reflected darkfield difference signal at said each corresponding point of interest in each of said first and second patterns; e. comparing said reflected brightfield images of step b. against said reflected brightfield images from corresponding illumination frequencies from said second pattern to develop a plurality of reflected brightfield difference signals at said each corresponding point of interest in each of said first and second patterns; and f. utilizing said reflected darkfield and brightfield difference signals of steps d. and e. together at said each point of interest as coordinates of a combined pattern reflected defect map.
 33. A method of inspection of a first pattern on a specimen for defects to be compared against a second pattern that is intended to be the same, said second pattern having known reflected darkfield and brightfield images each resulting from different selected frequencies of illumination at each point of interest, said method comprising the steps of:a. illuminating said first pattern on said specimen with darkfield illumination from a plurality of darkfield illumination sources, and brightfield illumination from a plurality of brightfield illumination sources, each of said brightfield and darkfield illumination sources having a different illumination frequency, the different illumination frequencies resulting in distinguishable darkfield and brightfield images of said first pattern; b. separately detecting a plurality of reflected brightfield images from said first pattern resulting from each of said plurality of brightfield illumination sources at said each point of interest independent of a darkfield image at said each point of interest; c. separately detecting a plurality of reflected darkfield images from said first pattern resulting from said plurality of darkfield illumination sources at said each point of interest independent of a brightfield image at said each point of interest; d. comparing said reflected darkfield images of step c. against said reflected darkfield images from corresponding illumination frequencies from said second pattern to develop a plurality of reflected darkfield difference signals at said each corresponding point of interest in each of said first and second patterns; e. comparing said reflected brightfield images of step b. against said reflected brightfield images from corresponding illumination frequencies from said second pattern to develop a plurality reflected brightfield difference signals at said each corresponding point of interest in each of said first and second patterns; and f. utilizing said reflected darkfield and brightfield difference signals of steps d. and e. together at said each point of interest as coordinates of a combined pattern reflected defect map.
 34. An inspection system to inspect a first pattern on a specimen for defects to be compared against a second pattern that is intended to be the same, said second pattern has known reflected darkfield and brightfield images each resulting from different selected frequencies of illumination at each point of interest, said inspection system comprising:an illumination system including:a brightfield illumination subsystem having a single brightfield illumination source to illuminate said first pattern on said specimen; and a darkfield illumination subsystem having a plurality of darkfield illumination sources to illuminate said first pattern on said specimen; with each of said brightfield and darkfield illumination sources having a different illumination frequency resulting in distinguishable reflected brightfield and darkfield images on said first pattern; a darkfield image detector positioned to individually detect reflected darkfield images from said each point of interest on said first pattern on said specimen resulting from each of said plurality of darkfield illumination sources independent of a brightfield image at said each point of interest; a brightfield image detector positioned to detect a reflected brightfield image from said each point of interest on said first pattern on said specimen independent of a darkfield image at said each point of interest; a darkfield comparator coupled to said darkfield image detector to generate a plurality of darkfield difference signals by comparing said reflected darkfield image from said darkfield image detector and said reflected darkfield images from corresponding illumination frequencies from said second pattern to develop a plurality of reflected darkfield difference signals at said each corresponding point of interest in each of said first and second patterns; a brightfield comparator coupled to said brightfield detector to generate a brightfield difference signal by comparing said reflected brightfield image from said brightfield image detector and said reflected brightfield image from said second pattern to develop a reflected brightfield difference signal at said each corresponding point of interest in each of said first and second patterns; and a processor coupled to said darkfield and brightfield comparators to utilize said reflected darkfield and brightfield difference signals together at said each point of interest as coordinates of a first pattern reflected defect map.
 35. An inspection system to inspect a first pattern on a specimen for defects to be compared against a second pattern that is intended to be the same, said second pattern has known reflected darkfield and brightfield images each resulting from different selected frequencies of illumination at each point of interest, said inspection system comprising:an illumination system including:a darkfield illumination subsystem having a single darkfield illumination source to illuminate said first pattern on said specimen; and a brightfield illumination subsystem having a plurality of brightfield illumination sources to illuminate said first pattern on said specimen; with each of said brightfield and darkfield illumination sources having a different illumination frequency resulting in distinguishable reflected brightfield and darkfield images on said first pattern; a brightfield image detector positioned to individually detect reflected brightfield images from said each point of interest on said first pattern on said specimen resulting from each of said plurality of brightfield illumination sources independent of a darkfield image at said each point of interest; a darkfield image detector positioned to detect a reflected darkfield image from said each point of interest on said first pattern on said specimen independent of a brightfield image at said each point of interest; a brightfield comparator coupled to said brightfield image detector to generate a plurality of brightfield difference signals by comparing said reflected brightfield images from said brightfield image detector and said reflected brightfield images from corresponding illumination frequencies from said second pattern to develop a plurality of reflected brightfield difference signals at said each corresponding point of interest in each of said first and second patterns; a darkfield comparator coupled to said darkfield detector to generate a darkfield difference signal by comparing said reflected darkfield image from said darkfield image detector and said reflected darkfield image from said second pattern to develop a reflected darkfield difference signal at each said corresponding point of interest in each of said first and second patterns; and a processor coupled to said darkfield and brightfield comparators to utilize said reflected darkfield and brightfield difference signals together at said each point of interest as coordinates of a first pattern reflected defect map.
 36. An inspection system to inspect a first pattern on a specimen for defects to be compared against a second pattern that is intended to be the same, said second pattern has known reflected darkfield and brightfield images each resulting from different selected frequencies of illumination at each point of interest, said inspection system comprising:an illumination system including:a darkfield illumination subsystem having a plurality of darkfield illumination sources to illuminate said first pattern on said specimen; and a brightfield illumination subsystem having a plurality of brightfield illumination sources to illuminate said first pattern on said specimen; with each of said brightfield and darkfield illumination sources having a different illumination frequency resulting in distinguishable reflected brightfield and darkfield images on said first pattern; a brightfield image detector positioned to individually detect reflected brightfield images from said each point of interest on said first pattern on said specimen resulting from each of said plurality of brightfield illumination sources independent of a darkfield image at said each point of interest; a darkfield image detector positioned to individually detect a plurality of reflected darkfield images from said each point of interest on said first pattern on said specimen resulting from each of said plurality of darkfield illumination sources independent of a brightfield image at said each point of interest; a brightfield comparator coupled to said brightfield image detector to generate a plurality of brightfield difference signals by comparing said reflected brightfield images from said brightfield image detector and said reflected brightfield images from corresponding illumination frequencies from said second pattern to develop a plurality of reflected brightfield difference signals at said each corresponding point of interest in each of said first and second patterns; a darkfield comparator coupled to said darkfield detector to generate a plurality of darkfield difference signals by comparing said reflected darkfield images from said darkfield image detector and said reflected darkfield images from corresponding illumination frequencies from said second pattern to develop a plurality of reflected darkfield difference signals at said each corresponding point of interest in each of said first and second patterns; and a processor coupled to said darkfield and brightfield comparators to utilize said reflected darkfield and brightfield difference signals together at said each point of interest as coordinates of a first pattern reflected defect map. 